Dis Mask, a subsidiary of Shanghai-listed China Resources Microelectronics (CR Micro), has raised 520 million yuan ($73.2 million) in a Series B funding round.
The round was participated by CICC Capital, a unit of Chinese investment bank CICC; the investment unit of Chinese brokerage CITIC Securities; local investment firms Hengchuang Investment and Phoenix Tree Capital Group.
Founded in 2012, Dis Mask is an independent subsidiary of CR Micro that manufactures photomask, which is a type of semiconductor mask essential for the production of integrated circuits. Semiconductor mask is a transparent plate that enables light to pass through to generate a pattern on a wafer.
The proceeds will help to accelerate the production capability of Dis Mask, according to a release published by Phoenix Tree Capital Group on Wednesday.
Previously, the Wuxi-headquartered firm sealed its Series A funding round in June 2022 led by local investment firms Xingcheng Capital and Baoding Investment.
Runpeng Semiconductor, another subsidiary of CR Micro, also raised its registered capital to 15 billion yuan ($2.1 billion) from 2.4 billion yuan ($329.5 million), according to a regulatory filing dated August 16.
Semiconductor firms continued to ride on a tailwind in Q3 with the completion of 125 deals worth nearly $3.4 billion, according to DealStreetAsia’s proprietary data. The Q3 funding sum was 41.6% more than the previous quarter and the highest since Q4 2021.